Installation magnetron sputtering ETNA-M
  • Company : AFM Probes, Tips, And Cantilevers – TipsNano
  • Region : Harjumaa , Estonia
  • Category : Measurement & Analysis Instruments > Other Measuring & Analysing Instruments
  • Specification : We present the design and products of our partners AFMHD: Installation magnetron sputtering ETNA-M Technical parameters: routine processing of specimens with a diameter of 100 mm; the location is face-down; maximum temperature – 350 º C; the diameter of the target 76 mm; power source DC 1100 W; voltage maximum 1000 V; pumping on the basis of dry scroll and turbo molecular pumps; number of gas channels: one with a maximum flow rate of 20 cm3/min; method of regulation - the
  • Quantity : 10
  • Contact Person : sales Manager|||development Department
  • Telephone :
  • Website : http://afmhd.ru/magnetronnoe-napylenie/ustanovka-magnetronno
  • Email : [email protected]
  • Update : Sep/10/2017
  • Product Details

    Installation magnetron sputtering ETNA-M is designed for deposition of metal layers. The reactor is made of stainless steel with top flange bearing on the function of heating of samples. The lower flange is water cooled magnetron with DC power. Focused on laboratory research and educational use and limited production.

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