Magnetron Sputtering Machine
  • Company : Advanced Material Corporation
  • Region : Shanghai , China
  • Category : Electronic Components & Supplies > Other Electronic Components
  • Contact Person : Jorge Wang|||Director
  • Telephone :
  • Website : www.asinoptics.com
  • Email : [email protected]
  • Update : Apr/14/2021
  • Product Details

    Main technical indexes: 1. ultimate vacuum: ?6.6X10³Pa 2. vacuum acquisition system adopts molecular pump + mechanical pump unit 3. continuous pumping for 30 minutes, the vacuum degree is less than or equal to 8x10³Pa 4. cylindrical sputtering targets can work independently or at the same time The 5. substrate ?60mm in diameter, can be heated to ?700?, with water cooling, substrate speed adjustable, adjustable target base moment Component Composition and specifications Vacuum chamber Number Single chamber Material 304 stainless steel Form Cylindrical vertical structure Dimension ?300XH250 Top seal Fluorine rubber seal Nozzle Contains two vacuum gauge interface, several magnetron sputtering target interface, a high vacuum valve interface, a drainage pipe interface, an observation window interface, three valve interface, three interface and operating mechanism of two electrical interface introduction. Opening mode Top cover lifting device without top lifting Lighting / drying 1x1000W lighting lamp, 1x1000w halogen lamp drying, drying temperature within 200? Vacuum pumping systems main pump Molecular pump 1pc forepump 6L rotary vane mechanical pump backing pump valve High vacuum valve adopts ultrahigh vacuum 1pc, bleed valve adopts ultrahigh vacuum stop valve three Pipe / joint Precision stainless steel tube, composed of bellows, quick unload street and double card sleeve joint Vacuum Measuring System Compound vacuum gauge, gauge adopts all metal bare gauge Magnetron Sputtering System Magnetron sputtering source One or two R60 magnetron sputtering targets Target mounting position Vacuum chamber plate Power Supply DC0.5KW,RF0.5KW each 1pc target size Round copper target ?60x2pcs Baffle operation Direct shaft 1pc Substrate system Substrate size / quantity ??60mm?1pc Substrate rotation autoroatation, speed 0-120/minute Target base torque 10cm, is adjustab

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