• Company Name : Allwin21 Corp.
  • About Us : Allwin21 Corp. was formed in 2000 to provide Rapid Thermal Process, Plasma Asher Stripper Descum, Plasma Etch/RIE/ICP, Sputtering and Evaporator System, Metrology and Tester high-tech equipment, services and technical support in Semiconductor industry, MEMS, Biomedical, Nanotechnology, Solar, LEDs etc.. Located in Santa Clara, the heart of Silicon Valley, Allwin21 has been providing unique technical support, high quality equipment and fast supplied spare parts worldwide. Allwin21 Corp. have maintained a global presence that has grown and expanded. into the major high-tech manufacturing areas of the world. We pride ourselves on developing lasting customer and client relationships.Allwin21 is proud to announce it is certified as ISO 9001:2008 compliant organizations. Allwin21 is the exclusive licensed manufacturer of AG Heatpulse 610 Rapid Thermal Processor. Allwin21 is manufacturing theAccuThermo AW 410, AccuThermo AW 610, AccuThermo AW 810, AccuTherm AW 820, AccuThermo AW 830 AtmosPress Rapid Thermal Processors and AccuThermo AW 610V, AccuThermo AW 820V, AccuThermo AW 860V vacuum Rapid Thermo Processors.Compared with traditional RTP system, Allwin21"s AccuThermo AW RTPs have innovative software and more advanced temperature control technologies. KEY FEATURES 1. Closed-loop temperature control with pyrometer or thermocouple temperature sensing. 2.Precise time-temperature profiles tailored to suit specific process requirements. 3.Fast heating and cooling rates unobtainable in conventional technologies. 4.Consistent wafer-to-wafer process cycle repeatability. 5.Elimination of external contamination. 6.Small footprint and energy efficiency. 7.The watchdog timer shuts down the lamps to prevent run-away heating of the wafer. Allwin21 is remanufacturing The AccuSputter &Acirc;&reg; AW 4450-Series Production Sputtering Systems, originally Perkin Elmer 4450 sputter systems, with innovative software with advanced controll technologies and new design for much better performance and maintenance.The AccuSputter &Acirc;&reg; AW 4450-Series Production Sputtering Systems are manufactured in the configuration of a manually-loaded system capable of fully automatic operation. The AccuSputter &Acirc;&reg; AW 4450 sputtering head is equipped with three DeltaTM cathode or four round 8-inch positions ( Mo flame sprayed shields and shutters standard). The AccuSputter &Acirc;&reg; AW 4450-Series Production Sputtering Systems deposit a wide variety of materials onto substrates such as ceramic, metal, plastics, glass and semiconductors. The system can also be used for RF sputter-etching, a process in which material is removed from, rather than being deposited on, the substrates prior to sputter deposition.These sputtering systems sequentially deposit thin films of up to three or four different materials onto a single substrate, thus attaining sandwich-structured films such as multi-layer optical interference filters or semiconductor devices. Resulting thin films range in thickness from a few Angstroms up to several microns. Download AccuSputter&Acirc;&reg; AW 4450 Brochure Description of Features: &acirc;€&cent; Advanced AccuSputter &Acirc;&reg;AW4450 Controller with GUI mounted in the main frame; &acirc;€&cent;Manual, Semi and Automatic one button operation; &acirc;€&cent;Customer programming of recipe for process parameters. &acirc;€&cent;GEM/SEC II functions (Optional) &acirc;€&cent;24V DC control components &acirc;€&cent;DC Gear Motors for table rotate and carriage moving; &acirc;€&cent;Advanced vacuum gauges and control system; &acirc;€&cent;MFC gas control system; &acirc;€&cent;Advanced RF automatically matching network; &acirc;€&cent;DC and RF power are mounted in the main frame; &acirc;€&cent;Fast Cycle Load Lock Operation ; &acirc;€&cent;High rate DeltaTM DC magnetron sputtering; &acirc;€&cent;High throughput operation: Automated load lock and controller sequences provide for efficient pump down and pallet transfer to process chamber &acirc;€&cent;High uniformity: &Acirc;&plusmn;7% deposition uniformity guaranteed with water-cooled rotating annular substrate table; &Acirc;&plusmn;5% achievable. &acirc;€&cent;Ultra-clean vacuum: Cryopumped and Meissner-trapped process chamber ensures contamination-free conditions especially important for critical processes such as the deposition of aluminum and platinum; &acirc;€&cent;Easy maintenance: Removable deposition shields permit easy system cleaning. Automatic cryopump regeneration minimizes downtime and inconvenience; &acirc;€&cent;Specialized pallets for ease of substrate leading/unloading; &acirc;€&cent; "Drop in" target for quick target changes, no screw to both with; &acirc;€&cent;"Snap-out" deposition shields for quick, easy maintenance; &acirc;€&cent;Fail-safe system protection Allwin21 Corp. professionally provides the following high-tech equipment with high Quality, right Cost, quick Delivery and excelent Service for Semiconductor industry, MEMS, Biomedical, Nanotechnology, Solar, LEDs etc. Download Brochure Rapid Thermal Process AccuThermo AW 410 |AccuThermo AW 610 |AccuThermo AW 810 |AccuThermo AW 820 |AccuThermo AW 830 |AccuThermo AW 610V | AccuThermo AW 820V | AccuThermo AW 860V Plasma Asher Descum &Acirc;&middot;Matrix 105R | Matrix 105/205/106 | Branson IPC L3200 |Branson IPC 2000/3000/4000 | Gasonics L3510 | Gasonics Aura 1000 | Gasonics Aura 3010 | Gasonics Aura 2000LL Plasma Etch/RIE/ICP Tegal 901e | Tegal 903e |Tegal 901e TTW | Tegal 903e TTW | Lam Rainbow 4420/4428 | Lam Rainbow 4520/4528 | Lam Rainbow 4620/4628 | Lam Rainbow 4720/4728 | Lam AutoEtch 490 | Lam AutoEtch 590 | Lam AutoEtch 690 | Lam AutoEtch 790 | Matrix 303 | Gasonics AE 2001 | STS Multiplex ICP Sputtering Deposition System AccuSputter AW 4450 | Perkin Elmer 4450 | Perkin Elmer 4410 | Perkin Elmer 2400 Metrology and Tester Tencor M-Gage 300 | Hitachi CD-SEM 8840 | Hitachi CD-SEM 8820 | Hitachi FE-SEM 4700 | Hitachi FE-SEM 4500 | HP 4062UX | HP 4145A/B | EG 2001 Probe | EG 1034 Probe | AW PCM System</p>
  • Product/Service : rapid thermal processors, sputter deposition, perkin-elmer sputtering system, perkin-elmer 4400, perkin-elmer 4410, perkin-elmer 4450, perkin-elmer 2400, perkin-elmer 4480, plasma asher, plasma etcher, hp 4062, eg 1034, eg 2001, eg 2010, Rapid Thermal Processor, Plasma Asher, Plasma Etcher, Metrology And Tester, Sputtering Deposition, Hitachi CD-SEM FE-SEM
  • Country/Region : United States >
  • Category : Electrical Equipment & Supplies
  • Contact Person : Mr. Peter Chen
  • Link More : United States Electrical Equipment & Supplies ,
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  • Address : 1550 Norman Ave, Santa Clara, California, USA
  • Website : www.allwin21.com
  • Business Type : Manufacturing